ADSORPSI ION LOGAM Cd(II) MENGGUNAKAN ADSORBEN HIDROKSI LAPIS GANDA Mg/Al TERINTERKALASI SENYAWA POLIOKSOMETALAT H4[a-SiW12O40]•nH2O

ASERI, SANDRA VIANI and Mohadi, Risfidian and Lesbani, Aldes (2018) ADSORPSI ION LOGAM Cd(II) MENGGUNAKAN ADSORBEN HIDROKSI LAPIS GANDA Mg/Al TERINTERKALASI SENYAWA POLIOKSOMETALAT H4[a-SiW12O40]•nH2O. Undergraduate thesis, Sriwijaya University.

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Abstract

Intercalation of H4[a-SiW12O40].nHO polyoxometalate on layered double hydroxide by comparison weight rasio of layered double hydroxide:H2[aSiW12O40].nH O polyoxometalate 1:1 has been done. The result of intercalated layered double hydroxide was characterized using FT-IR spectrophotometer and XRD analysis. Characterization using FT-IR were not showed the optimal intercalation process. The success of the intercalation process showed from the characterization using XRD, evident from the increased inter layer spacing of layered double hydroxide after the intercalation process, the spacing between the layered double hydroxide before intercalation is 7.59 Ȧ to 7.67 Ȧ after the intercalation process. Then, layered double hydroxide intercalated H2[aSiW12O40].nHO polyoxometalate was applied as metal ion Cd(II) adsorbent. The process of adsorption of Cd(II) metal ion using layered double hydroxide intercalated H24[a-SiW12O40].nHO polyoxometalate showed the adsorption rate(k) was 0,019 min-12, the largest adsorption capasity (b) at 70o was 1.46 mol/g, the largest adsorption energy (E) at 30oC was 8.19 kJ/mol. The effect adsorption of pH showed optimum pH was at pH 8 with amount of metal ion Cd(II) adsorbed were 7.87 ppm.

Item Type:	Thesis (Undergraduate)
Uncontrolled Keywords:	layered double hydroxide, polyoxometalate, H4[a-SiWO,intercalation, metal adsorption
Subjects:	Q Science > QD Chemistry > QD1-999 Chemistry Q Science > QD Chemistry > QD450-801 Physical and theoretical chemistry
Divisions:	08-Faculty of Mathematics and Natural Science > 47201-Chemistry (S1)
Depositing User:	Mrs Dies Meirita Sari
Date Deposited:	23 Jul 2019 07:28
Last Modified:	23 Jul 2019 07:28
URI:	http://repository.unsri.ac.id/id/eprint/593

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